Molybdenum Rotary Sputtering Targets

• Application: Aviation, Electronics, Industrial, Medical, Chemical, Furnace Construction
• Standard: GB, DIN, ASTM
• Purity: >99.95%
• Alloy: Non-alloy
• Type: Molybdenum Bar
• Powder: Not Powder
• Model NO.: Mo1
• Designing Scheme: Qos
• Transport Package: Composite Board Box
• Specification: Upon request
• Trademark: SNMTCO
• Origin: China
• HS Code: 8486202100
• Production Capacity: 500 Sets/Year

Product Description

Snmtco offers sputtering targets that improve the performance of thin film absorber layers.
Our molybdenum rotary sputtering targets combine optimized target geometries and material properties for an efficient coating process and the best sputtering results. They are used in a wide range of applications, such as flat panel displays, photovoltaics and large area coatings. With our materials and application expertise and state of the art processing technologies we are the leading supplier for CIGS producers and major OEMs,

Application fields:

• Back contact in thin film solar cells
• Electrode material for TFT-LCD metallization
• Adhesion and barrier layer for Al- and Cu-metallization for TFT-LCD

 

Advantages:

• Fully dense material because of special deformation processes
• Higher usage rates than planar targets
• High thermal conductivity

 

Properties of molybdenum rotary sputtering targets
Density (at 20°C)	> 99.8 % of theoretical density
Purity (without tungsten)	> 99.97 wt%
Thermal conductivity (at 20°C)	140 W/(m.K)
Target material thickness	typical: 10 to 15 mm
Target length	monolithic or bonded on backing tube up to 4 m
Microstructure	fine grained, uniform (stress relieved)

High usage rates
Rotary targets provide double or even triple the material utilization of planar targets. Rotary monolithic versions hold the record: they maintain their stability even after target utilization of more than 75 %.
High thermal conductivity
Monolithic targets contribute to greater productivity and improved efficiency for a faster coating process. Without a low-melting bonding layer, monolithic targets allow the highest heat transfer rates. Monolithic rotary targets can be run with up to 30 kW/m power.

High quality material

• Fully dense, uniform and fine grained microstructure
• Guaranteed purity of more than 99.97 % (without tungsten)
• Excellent thermal heat transfer
• Low thin film resistivity possible (typical: 15 µOhm.cm)
• High mechanical strength

 

• 3.1 certificate (EN 10204) for the 21 most critical elements
• GDMS, ICP-OES, AAS, LECO for trace and ultra trace analysis
• Metallography (Light optical microscopy, SEM) for microstructural analysis
• Ultrasonic testing